Inspired by the African masks in the Rietberg Museum in Zurich, the Swiss artist Lukas Stucky designed a mask and asked the Congolese artist Rita Mukebo to give it the status of an artwork. In a short film produced by Centre d’Art Waza Lubumbashi, Mukebu tests the relevance of the mask by visiting the Tshokwe community, the art museum director, a university professor, and others.
Return: An Epic Journey. Directed by Rita Mukebu. Produced by Centre d’Art Waza, Lubumbashi, 2021. 15 min.